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1200°C MIST CVD Furnace for Crystal Growth

The OTF-1200X-Mist is a state-of-the-art 1200°C MIST CVD Furnace designed for epitaxial thin film or single crystal growth. This innovative furnace integrates an ultrasonic mist system, making it a powerful tool for high-quality crystal growth. Its core features include a 3KW, 220VAC power supply, a programmable temperature controller with +/- 1°C accuracy, and a 400 mm long heating zone with a 125 mm constant temperature zone.

Advanced Specifications and Technical Details

The OTF-1200X-Mist is equipped with a quartz processing tube and a quartz sample holder, ensuring optimal performance and ease of use. The ultrasonic mist generator offers 4 levels of power adjustment and a mist time range of 30-180 minutes, allowing for precise control of the CVD process. Additionally, the MFC gas delivery system provides 4 channels for gas mixing and delivery, with adjustable flow rates and high accuracy. This comprehensive system ensures a controlled and efficient CVD process.

Practical Applications and Benefits

The OTF-1200X-Mist is ideal for growing Ga2O3 crystals with high quality, making it a valuable tool for researchers and manufacturers in the semiconductor and material science fields. Its advanced features and reliable performance make it suitable for various applications, including epitaxial thin film deposition and single crystal growth. With its touch screen control panel, RS 485 port, and PC operation software, the OTF-1200X-Mist offers ease of use and flexibility, making it a perfect choice for users seeking a reliable and efficient CVD furnace.