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SEMI P47: Standard for Line and Linewidth Roughness Evaluation

The SEMI P47 standard is a crucial tool for the semiconductor industry, providing a standardized method for evaluating line-edge roughness (LER) and linewidth roughness (LWR). This document is designed to ensure consistent and reliable measurements, which are essential for fine line pattern fabrication in integrated circuit manufacturing. By adhering to the SEMI P47 standard, manufacturers can enhance the quality of their products and maintain consistency across their production processes.

Key Features and Specifications:

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• Standardized Procedures: SEMI P47 outlines specific procedures for calculating the indices of LER and LWR, ensuring uniformity in measurements.
• Scope of Application: The standard is applicable to various shapes, including lines, circles, and arcs, making it versatile for different types of pattern fabrication.
• Image Processing: The standard focuses on evaluating the apparent LER or LWR from the two-dimensional image of the observed line pattern, such as CD-SEM or AFM results.

Practical Uses and Benefits:

The SEMI P47 standard is an invaluable resource for semiconductor manufacturers looking to improve the quality and consistency of their products. By using this standard, companies can: -

• Enhance the precision and reliability of their manufacturing processes.
• Ensure compliance with industry standards and regulations.
• Identify and address potential issues in the production process, leading to improved product quality.

With its technical expertise and global recognition, the SEMI P47 standard is a must-have for any semiconductor manufacturer aiming to excel in the competitive landscape of fine line pattern fabrication.