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Worldwide Shipping F04600 - Semi F46 - Save 50% Now [N1uwdlHy]

$36.99 $118.99 -69%

SEMI F46 - Guide to On-Site Chemical Generation (OSCG) The SEMI F46 guide is a comprehensive resource for semiconductor manufacturing professionals seeking to implement On-Site Chemical Generation (OSCG) systems. This guide is the direct responsibili

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Worldwide Shipping F04600 - Semi F46 - Save 50% Now [N1uwdlHy]

SEMI F46 - Guide to On-Site Chemical Generation (OSCG)

The SEMI F46 guide is a comprehensive resource for semiconductor manufacturing professionals seeking to implement On-Site Chemical Generation (OSCG) systems. This guide is the direct responsibility of the North American Facilities Committee and has been technically approved by the global Facilities Committee. Its current edition was approved by the North American Regional Standards Committee on April 15, 1999, and was initially available online since August 1999. Despite being inactive, it remains a valuable reference for its detailed insights into the design, performance, and certification of OSCG systems. The guide emphasizes the minimum system and overall implementation requirements for OSCG systems, ensuring they meet the stringent standards of semiconductor manufacturing.

Key Features and Specifications

This guide is designed to establish a common basis for developing detailed guides in subsequent documents. It applies specifically to the design of OSCG systems used for generating chemicals, particularly ultra-high purity solutions, essential for silicon wafer, integrated circuit, and/or substrate manufacturing processes. The guide outlines various concentrations of chemicals such as NH4OH, HCl, HF, and NH4F aqueous solutions. The referenced SEMI standard, SEMI S2, provides additional safety guidelines for semiconductor manufacturing equipment, further enhancing the value of this guide. Its technical approval by esteemed committees ensures the guide's reliability and practicality.

Practical Applications and Benefits

The SEMI F46 guide is an indispensable tool for professionals in the semiconductor industry. It not only provides a framework for the design and implementation of OSCG systems but also ensures compliance with safety standards set forth by SEMI. The guide's practical applications extend to various manufacturing processes, where the generation of ultra-high purity chemicals is critical. By following the guidelines, manufacturers can benefit from improved efficiency, reduced costs, and enhanced product quality. This guide is particularly beneficial for semiconductor manufacturers looking to optimize their chemical generation processes, ensuring they meet the highest industry standards.

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